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Title:
Effect of energetic ion irradiation on CdI2 films
Authors:
Rawat, R. S.; Arun, P.; Vedeshwar, A. G.; Lee, P.; Lee, S.
Affiliation:
AA(National Sciences, National Institute of Education, Nanyang Technological University, Singapore), AB(Department of Physics & Astrophysics, University of Delhi, Delhi-110 007, India), AC(Department of Physics & Astrophysics, University of Delhi, Delhi-110 007, India), AD(National Sciences, National Institute of Education, Nanyang Technological University, Singapore), AE(International Centre for Dense Magnetised Plasma, Warsaw, Poland)
Publication:
Journal of Applied Physics, Volume 95, Issue 12, pp. 7725-7730 (2004). (JAP Homepage)
Publication Date:
06/2004
Origin:
AIP
PACS Keywords:
Ion radiation effects, Crystal stoichiometry, Structure and morphology, thickness, crystalline orientation and texture, Insulators, Other inorganic compounds, Optical constants
Abstract Copyright:
2004: American Institute of Physics
DOI:
10.1063/1.1738538
Bibliographic Code:
2004JAP....95.7725R

Abstract

The effect of energetic argon ion irradiation, using a 3.3 kJ pulsed plasma focus device, is studied systematically on a 4H polytype (002)-oriented CdI2 stoichiometric film having compressive residual stress. The CdI2 films were exposed to energetic ions from the plasma focus device at different distances from the top of the central electrode. The irradiation was found to change the orientation of the film to (110) at certain moderate irradiation distances. A linear decrease in grain size and residual stress was observed with decreasing irradiation distance (or increasing ion energy), consistent with both structural and morphological observations. The direct optical energy gap Eg was found to increase linearly at the rate 15 μeV/atm with the compressive stress. The combined data of present compressive stress and from earlier reported tensile stress show a consistent trend of Eg change with stress. The iodine-iodine distance in the unit cell could be responsible for the observed change in Eg with stress.
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