| Title: |
| Electronic stopping of heavy ions in the Kaneko model |
| Authors: |
| Mathar, Richard J.; Posselt, Matthias |
| Affiliation: |
| Institut für Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf e. V., Postfach 510119, 01314 Dresden, Germany |
| Publication: |
| Physical Review B (Condensed Matter), Volume 51, Issue 22, June 1, 1995, pp.15798-15807 (PhRvB Homepage) |
| Publication Date: |
| 06/1995 |
| Origin: |
| AIP; APS |
| PACS Keywords: |
| Doping and impurity implantation in germanium and silicon |
| Abstract Copyright: |
| (c) 1995: The American Physical Society |
| DOI: |
| 10.1103/PhysRevB.51.15798 |
| Bibliographic Code: |
| 1995PhRvB..5115798M |