Nanoindentation Studies Of Hard Nanocomposite Ti-B-N Thin Films
Abstract
Titanium boron nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using single Titanium diboride (TiB2) target in different Ar-N2 gas mixtures. The influence of N2:Ar ratio on the microstructure and mechanical properties of the deposited films have been investigated. Atomic force microscopy analysis indicated the grain size decreases with incorporation of nitrogen in the films. Nanoindentation studies have shown the hardness decreases with nitrogen incorporation.
- Publication:
-
International Conference on Advances in Condensed and Nano Materials (ICACNM-2011)
- Pub Date:
- December 2011
- DOI:
- 10.1063/1.3653698
- Bibcode:
- 2011AIPC.1393..239R
- Keywords:
-
- sputtering;
- phase diagrams;
- X-ray diffraction;
- hardness;
- 81.15.Cd;
- 81.30.Bx;
- 61.05.cp;
- 62.20.Qp;
- Deposition by sputtering;
- Phase diagrams of metals and alloys;
- X-ray diffraction;
- Tribology and hardness